Sannomiya, Takumi, Dr.
ETH Zürich
PhD 2009
E-Mail:
Current Research
Research Interests
- Plasmonic materials
- Optical biosensors
- Electromagnetic simulation
- Scanning / Transmission electron microscopy (STEM/TEM)
- Aberration correctors (Cs correctors) for STEM/TEM
- Magnetic thin films and domain structures
Publication
- “In situ Sensing of Single Binding Events by Localized Surface Plasmon Resonance”
T. Sannomiya, Ch. Hafner, J. Voros
Nano Letters, Volume 8, No.10, 2008, pp. 3450–3455
- “Measurement method of aberration from Ronchigram by autocorrelation function”
H. Sawada, T. Sannomiya, F. Hosokawa, T. Nakamichi, T. Kaneyama, T. Tomita, Y. Kondo, T. Tanaka, Y. Oshima, Y. Tanishiro, K. Takayanagi
Ultramicroscopy, Volume 108, 2008, pp. 1467–1475
- “Achieving 63pm Resolution in Scanning Transmission Electron Microscope with Spherical Aberration Corrector”
H. Sawada, F. Hosokawa, T. Kaneyama, T. Ishizawa, M. Terao, M. Kawazoe, T. Sannomiya, T. Tomita, Y. Kondo, T. Tanaka, Y. Oshima, Y. Tanishiro, N. Yamamoto, K. Takayanagi
Japanese Journal of Applied Physics, Volume 46, No 23, 2007, pp. L568–L570
- “Ultrahigh-Vacuum Third-Order Spherical Aberration (Cs) Corrector for a Scanning Transmission Electron Microscope”
K. Mitsuishi,1, M. Takeguchi, Y. Kondo, F. Hosokawa, K. Okamoto, T. Sannomiya, M. Hori, T. Iwama, M. Kawazoe, K. Furuya
Microscopy and Microanalysis, Volume 12, Issue 6, 2006, pp.456-460
- “Correlation between magnetization performance and magnetic microstructure of patterned permalloy films fabricated by microcontact printing”
T. Sannomiya, J. Shi, Y. Nakamura, O. Nittono.
Journal of Applied Physics, Volume 96, Issue 9, 2004, pp. 5050-5055
- “Observation of magnetic structures in Fe granular films by differential phase contrast scanning transmission electron microscopy”
T. Sannomiya, Y. Haga, Y. Nakamura, O. Nittono, Y. Takahashi.
Journal of Applied Physics, Volume 95, Issue 1, 2004, pp. 214-218
etc
Patent
- “Transmission Electron Microscope”
T. Sannomiya, Y. Kondo
United States Patent #US20080011949 (2008) - “Method of measuring aberrations and correcting aberrations using ronchigram and electron microscope”
H. Sawada, T. Sannomiya
United States Patent #US20070120055 (2007)